Notably, these properties can be maintained even at the atomic scale. Meanwhile, these properties also pose challenges in achieving highly precise and smooth etching of HFO2 films. Now, a group of ...
The process comprises a surface nitrogenation step via N + ion bombardment, followed by O 2 plasma treatment to form volatile etching byproducts. This approach enables subatomic-level etching ...
Tooled as viable and environmentally friendly replacements for aluminum, polymer, and high CV ceramic capacitors, the OxiCap Niobium Oxide (NbO), solid-electrolyte capacitors specify an ESR figure ...
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